Olympus MPlanFL N 5X Epi Objective | 0.15 NA, Infinity Corrected nir-new combining ultra-high numerical aperture

combining ultra-high numerical aperture

4mm Working Distance — Generous clearance accommodates varied sample geometries and measurement configurations

🔬 Compatible with Leica compound microscopes

Specification Details Catalog Number 506193 Magnification 63× Numerical Aperture (NA) 1

Olympus MPlanFL N 5X Epi Objective | 0.15 NA, Infinity Corrected nir-new combining ultra-high numerical aperturePremium 5 objective with long working distance and dual imaging modes ideal for versatile industrial microscopy. 5 Magnification, NA 0. 15 Wide field of view with excellent depth of field for overview imaging and inspection. Brightfield Darkfield Capability Dual mode imaging for enhanced contrast and defect detection on reflective surfaces. Long Working Distance (20 mm) Generous clearance provides specimen safety and accommodates thicker samples.