Olympus MXPLANFL N 20X Objective – 0.60 NA, 3 mm WD Plan Fluorite Brightfield SEMICONDUCTOR INSPECTION workpieces

workpieces

samples requiring environmental chambers

and this configuration combines reflected and transmitted light polarized light capability with brightfield and darkfield contrast in a single

while the 3

Olympus MXPLANFL N 20X Objective – 0.60 NA, 3 mm WD Plan Fluorite Brightfield SEMICONDUCTOR INSPECTION workpiecesPremium 20 semi apochromatic objective with ultra high 0. 60 numerical aperture and exceptional field flatness ideal for maximum resolution imaging, image stitching, and advanced industrial microscopy. Working Distance: 3mm 20 Magnification, NA 0. 60 Ultra high numerical aperture for maximum resolution and exceptional light gathering capability. Superior Field Flatness Exceptional image uniformity from center to edge, ideal for image stitching and