Olympus PLANAPO 100x Objective LMPLFLN100XBD • Surface topography and grain

• Surface topography and grain structure characterization with pseudo-3D DIC contrast

providing 30–60× more clearance for specimens in environmental chambers

✔ True Interference Coating Technology

where the long working distance provides clearance for laser delivery optics and specimen fixtures

Olympus PLANAPO 100x Objective LMPLFLN100XBD • Surface topography and grainOLYMPUS PLANAPO 100X OBJECTIVE RMS THREAD COMPATIBLE WITH: BX & IX SERIES MICROSCOPES WORKING DISTANCE: 0. 10 MM NUMERICAL APERTURE: 1. 40 CATALOG NUMBER: 1 UB935 CONDITION: EXCELLENT, FLAWLESS OPTICS UNIVERSITY PURCHASE ORDERS ACCEPTED THANK YOU FOR VIEWING AND PLEASE FEEL FREE TO CALL OR EMAIL WITH ANY QUESTIONS