Nikon CFI S Plan Fluor 60X ELWD Objective NEW MITUTOYO • Semiconductor wafer inspection and
Description
• Semiconductor wafer inspection and defect analysis
Advanced research microscopy in thick samples
allowing simultaneous visual observation and camera-based image capture without compromising the primary viewing path
frames per second (fps*) 25fps@1920x1080
Nikon CFI S Plan Fluor 60X ELWD Objective NEW MITUTOYO • Semiconductor wafer inspection andNikon CFI S Plan Fluor 60X ELWD Microscope Objective High performance plan fluorite objective with extra long working distance 60X magnification with 0. 70 numerical aperture for high resolution Superior fluorite optics deliver enhanced chromatic correction for fluorescence Extra long 1. 82. 6mm working distance ideal for thick specimens and culture vessels M25 thread compatible with Nikon CFI infinity corrected microscope systems Professional grade
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